PECVD Tube Furnace with 4 channels

1200C Max. PECVD Tube Furnace w/ 4 Channels Gas Delivery & Vacuum Pump is acompact PE-CVD (Plasma Enhanced Chemical Vapor Deposition) tube furnace system, which consists of 300W RF plasma source, 2″ or 3.14″ O.D optional split tube furnace, 4 channels precision mass flow meter with gas mixing tank, and high-quality mechanical pump. The PE-CVD furnace is an ideal and affordable tool to deposit thin films or grow nanowire from a gas state (vapor) to a solid-state, and benefits:

Lower temperature processing compared to conventional CVD.
Film stress can be controlled by high/low frequency mixing techniques.
Control over stoichiometry via process conditions.
Offers a wide range of material deposition, including SiOx, SiNx, SiOxNy and Amorphous silicon (a-Si:H) deposition.

Features

1.Multi-Channel Gas Delivery System:

Equipped with a four-channel gas delivery system, which allows the simultaneous use of multiple reactive gases, providing greater flexibility for complex chemical vapor deposition processes. This enables researchers to optimize the ratios of various precursor gases within a single experiment, resulting in superior film quality.

2.Integrated Vacuum Pump:

The integrated vacuum pump facilitates rapid establishment and maintenance of the required vacuum environment, ensuring that air contaminants are removed during the PECVD process, thereby enhancing the purity and uniformity of the deposited films.

3.Uniform Temperature Distribution:

A well-designed heating element and insulation system ensure uniform temperature distribution within the heating zone, leading to consistency and reproducibility in the film deposition process.

4.Advanced Temperature Control:

Utilizes a PID temperature controller for precise temperature control, ensuring minimal fluctuations during the PECVD process, which improves the quality of the deposited films and the stability of the process.

5.Flexibility and Adaptability:

Offers customization options to meet different experimental needs, such as adding sensors or gas flow control systems, to adapt to specific research or industrial processes.

Specifications

Split Tube furnace	1200^oC Max. working temperature for < 60 minutes 1100^oC Max for continuous heating 30 segments programmable precision digital temperature controller 440 mm length single heating zone and 150 mm length constant temperate zone High purity quartz tube optional from One pair of the vacuum-sealed flange with valves 2″OD x 1.7″ID x 48″ Length 3.14″OD x 2.83″ID x 48” Length Input power: 208 – 240V AC input, a single phase at max. 4KW Two zones split furnace is optional at extra cost
Plasma RF Power Supply	Output Power: 5 -300W adjustable with ± 1% stability RF frequency: 13.56 MHz ±0.005% stability Reflection Power: 200W max. Matching: Automatic RF Output Port: 50 Ω, N-type, female Noise: <50 dB. Cooling: Air cooling. Power: 208-240VAC, 50/60Hz Note: This RF power supply can accept 50 – 80 mm Max. quartz tube by changing flange
Anti-corrosive Pressure Gauge	3.8×10^-5 to 1125 Torr measurement range Anti-corrosive, gas-type independent High accuracy and reproducibility at atmosphere for reliable atmospheric pressure detection Fast atmospheric detection eliminates waiting time and shortens the process cycle Easy to exchange plug & play sensor element
Vacuum Pump and valve	Heavy-Duty Rotary Vane Vacuum Pump (7.8 CFM -240 L/m) with Two-Stage Exhaust System installed in the bottom case with max. vacuum pressure 10^-2 torr. KFD25 adapter and stainless steel pipe are connected between pump and tube flange with precision ball valve Digital vacuum pressure gauge and display are installed with the furnace
Optional Oilless Pump	Please order the oilless pump for zero contamination
Mass Flowmeter	4-channeled Gas Mixing Made of 316 stainless steel valve Gas mixing tank: Φ80X120mm 600mm(L) x 745mm(W) x 700mm(H) 6″ color touch screen control panel to make parameter setting at easy. Touchscreen Control and PC remote switchable. 23W per channel AC 220V/50Hz Single phase Gas Types: Capable of handling inert gases, reactive gases, and custom gas mixtures
Temperature Controller	certified 30 programmable segments for precise control of heating rate, cooling rate and dwell time. Built-in PID Auto-Tune function with overheating & broken thermocouple protection. Over-temperature protection and alarm allow for operation without attendant(s). +/- 1 ºC temperature accuracy. RS485 Communications Port.
Overall dimensions	Furnace: 550mm(L) x 380mm(W) x 520mm(H) 3 Bottom Mobile case together: 1800mm(L) x 850mm(W) x 700mm(H)
Warranty	One year limited warranty with lift time support (Consumable parts such as processing tubes, O-rings, and heating elements are not covered by the warranty.)
Laptop, software & WiFi Control (Optional)	Brand new laptop *Labview Based Temperature Control System* enables users to edit temperature profiles, manage heat-treatment recipes, record and plot data for furnaces.
Warning	The tube furnaces with quartz tube are designed for use under vacuum and low pressure < 0.2 bars / 3 psi Attention: A two-stage pressure regulator must be installed on the gas cylinder to limit the pressure to below 3 PSI for safe operation. Vacuum limit definition for all quartz tube furnaces: * Vacuum pressures may only be safely used up to 1000°C The flow rate for gasses should be limited to<200 SCCM for reducing thermal shocks to the tube
Shipping Dimensions	Pallet #1: 48″ x 40″ x 65″ Pallet #2: 48″ x 40″ x 40″ Pallet #3: 48″ x 40″ x 40″ Pallet #4: 48″ x 40″ x 40″
Total Shipping Weight	1100 lbs
Sample Sliding Mechanism	Optional for introducing and removing samples under vacuum